JPH0418454B2 - - Google Patents

Info

Publication number
JPH0418454B2
JPH0418454B2 JP56157524A JP15752481A JPH0418454B2 JP H0418454 B2 JPH0418454 B2 JP H0418454B2 JP 56157524 A JP56157524 A JP 56157524A JP 15752481 A JP15752481 A JP 15752481A JP H0418454 B2 JPH0418454 B2 JP H0418454B2
Authority
JP
Japan
Prior art keywords
illuminance
optical system
light source
sensor
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56157524A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5858730A (ja
Inventor
Mitsuhiro Morita
Hiroshi Nishizuka
Takayoshi Oosakaya
Takashi Fujimura
Yoichiro Tamya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Renesas Eastern Japan Semiconductor Inc
Original Assignee
Hitachi Tokyo Electronics Co Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Tokyo Electronics Co Ltd, Hitachi Ltd filed Critical Hitachi Tokyo Electronics Co Ltd
Priority to JP56157524A priority Critical patent/JPS5858730A/ja
Publication of JPS5858730A publication Critical patent/JPS5858730A/ja
Publication of JPH0418454B2 publication Critical patent/JPH0418454B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP56157524A 1981-10-05 1981-10-05 投影露光装置 Granted JPS5858730A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56157524A JPS5858730A (ja) 1981-10-05 1981-10-05 投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56157524A JPS5858730A (ja) 1981-10-05 1981-10-05 投影露光装置

Publications (2)

Publication Number Publication Date
JPS5858730A JPS5858730A (ja) 1983-04-07
JPH0418454B2 true JPH0418454B2 (en]) 1992-03-27

Family

ID=15651547

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56157524A Granted JPS5858730A (ja) 1981-10-05 1981-10-05 投影露光装置

Country Status (1)

Country Link
JP (1) JPS5858730A (en])

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6120322A (ja) * 1984-07-07 1986-01-29 Ushio Inc 水銀灯による半導体ウエハ−材料の露光方法
JPS6119940A (ja) * 1984-07-07 1986-01-28 Mitsubishi Heavy Ind Ltd 吸気及び排気方法
JPS6146023A (ja) * 1984-08-10 1986-03-06 Ushio Inc 超高圧水銀灯による半導体ウエハ−材料の露光方法
JP2902272B2 (ja) * 1993-08-27 1999-06-07 株式会社三協精機製作所 磁気カードリーダ

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51126071A (en) * 1975-04-25 1976-11-02 Hitachi Ltd Mask pattern printing method and the equipment
JPS5775533U (en]) * 1980-10-27 1982-05-10
JPS57101839A (en) * 1980-12-18 1982-06-24 Nippon Kogaku Kk <Nikon> Exposure device for wafer or photomask

Also Published As

Publication number Publication date
JPS5858730A (ja) 1983-04-07

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